| Шығарылым |
Бөлім |
Атауы |
Файл |
| Том 50, № 2 (2016) |
Amorphous, Vitreous, and Organic Semiconductors |
Composition and optical properties of amorphous a-SiOx:H films with silicon nanoclusters |
|
| Том 50, № 4 (2016) |
Physics of Semiconductor Devices |
On the formation of silicon nanoclusters ncl-Si in a hydrogenated amorphous silicon suboxide matrix a-SiOx:H (0 < x < 2) with time-modulated dc magnetron plasma |
|
| Том 52, № 10 (2018) |
Amorphous, Vitreous, and Organic Semiconductors |
Effect of the Temporal Characteristics of Modulated DC Plasma with the (SiH4–Ar–O2) Gas Phase on ncl-Si Growth in an a-SiOx:H matrix (\({{C}_{{{{{\text{O}}}_{{\text{2}}}}}}}\) = 15.5 mol %) |
|
| Том 53, № 11 (2019) |
Amorphous, Vitreous, and Organic Semiconductors |
Formation of ncl-Si in the Amorphous Matrix a-SiOx:H Located near the Anode and on the Cathode, Using a Time-Modulated DC Plasma with the (SiH4–Ar–O2) Gas Phase (\({{{\text{C}}}_{{{{{\text{O}}}_{2}}}}}\) = 21.5 mol %) |
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