Enviar artigo por via de e-mail Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
- Autores: Demidov E.V.1, Komarov V.A.1, Krushelnitckii A.N.1, Suslov A.V.1
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Afiliações:
- Herzen State Pedagogical University of Russia
- Edição: Volume 51, Nº 7 (2017)
- Páginas: 840-842
- Seção: XV International Conference “Thermoelectrics and Their Applications—2016”, St. Petersburg, November 15–16, 2016
- URL: https://journal-vniispk.ru/1063-7826/article/view/200145
- DOI: https://doi.org/10.1134/S1063782617070065
- ID: 200145
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Resumo
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
Sobre autores
E. Demidov
Herzen State Pedagogical University of Russia
Autor responsável pela correspondência
Email: demidov_evg@mail.ru
Rússia, St. Petersburg, 191186
V. Komarov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Rússia, St. Petersburg, 191186
A. Krushelnitckii
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Rússia, St. Petersburg, 191186
A. Suslov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Rússia, St. Petersburg, 191186
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