Defects in mercury-cadmium telluride heteroepitaxial structures grown by molecular-beam epitaxy on silicon substrates
- 作者: Mynbaev K.D.1,2, Zablotsky S.V.1,3, Shilyaev A.V.1, Bazhenov N.L.1, Yakushev M.V.4, Marin D.V.4, Varavin V.S.4, Dvoretsky S.A.4,5
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隶属关系:
- Ioffe Physical–Technical Institute
- ITMO National Research University
- St. Petersburg State Electrotechnical University “LETI”
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- National Research Tomsk State University
- 期: 卷 50, 编号 2 (2016)
- 页面: 208-211
- 栏目: Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena
- URL: https://journal-vniispk.ru/1063-7826/article/view/196777
- DOI: https://doi.org/10.1134/S1063782616020160
- ID: 196777
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详细
Defects in mercury-cadmium-telluride heteroepitaxial structures (with 0.3 to 0.4 molar fraction of cadmium telluride) grown by molecular-beam epitaxy on silicon substrates are studied. The low-temperature photoluminescence method reveals that there are comparatively deep levels with energies of 50 to 60 meV and shallower levels with energies of 20 to 30 meV in the band gap. Analysis of the temperature dependence of the minority carrier lifetime demonstrates that this lifetime is controlled by energy levels with an energy of ∼30 meV. The possible relationship between energy states and crystal-structure defects is discussed.
作者简介
K. Mynbaev
Ioffe Physical–Technical Institute; ITMO National Research University
编辑信件的主要联系方式.
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021; St. Petersburg, 197101
S. Zablotsky
Ioffe Physical–Technical Institute; St. Petersburg State Electrotechnical University “LETI”
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021; St. Petersburg, 197376
A. Shilyaev
Ioffe Physical–Technical Institute
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
N. Bazhenov
Ioffe Physical–Technical Institute
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
M. Yakushev
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, Novosibirsk, 630090
D. Marin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, Novosibirsk, 630090
V. Varavin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, Novosibirsk, 630090
S. Dvoretsky
Rzhanov Institute of Semiconductor Physics, Siberian Branch; National Research Tomsk State University
Email: mynkad@mail.ioffe.ru
俄罗斯联邦, Novosibirsk, 630090; Tomsk, 634050
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