Formation of Porous Silicon by Nanopowder Sintering
- 作者: Astrova E.V.1, Voronkov V.B.1, Nashchekin A.V.1, Parfeneva A.V.1, Lozhkina D.A.1, Tomkovich M.V.1, Kukushkina Y.A.1
-
隶属关系:
- Ioffe Institute
- 期: 卷 53, 编号 4 (2019)
- 页面: 530-539
- 栏目: Physics of Semiconductor Devices
- URL: https://journal-vniispk.ru/1063-7826/article/view/205991
- DOI: https://doi.org/10.1134/S1063782619040031
- ID: 205991
如何引用文章
详细
The technique of the electrochemical and photoelectrochemical etching of single-crystal silicon wafers commonly used to fabricate macroporous silicon layers is inefficient and costly. An alternative method for forming bulk macroporous silicon is the high-temperature sintering of Si powder. The process of nanopowder sintering preliminarily subjected to dry cold compression (without binding additives) is investigated. The properties of the sintered material, including its microstructure, density, and electrical conductivity, are studied at different annealing temperature and time. Techniques for changing the porosity of the sintered samples and for determining of the interior surface area are discussed.
作者简介
E. Astrova
Ioffe Institute
编辑信件的主要联系方式.
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
V. Voronkov
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Nashchekin
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Parfeneva
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
D. Lozhkina
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
M. Tomkovich
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
Yu. Kukushkina
Ioffe Institute
Email: east@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
补充文件
