Enviar artigo por via de e-mail Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes
- Autores: Mitin D.M.1,2, Raudik S.A.1, Mozharov A.M.3, Bolshakov A.D.1, Fedorov V.V.1, Nepokh V.V.1, Rajanna P.M.4, Nasibulin A.G.4, Mukhin I.S.1,3
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Afiliações:
- Saint Petersburg Academic University
- Ioffe Institute
- ITMO University
- Skolkovo Institute of Science and Technology
- Edição: Volume 53, Nº 14 (2019)
- Páginas: 1926-1928
- Seção: Nanostructures Characterization
- URL: https://journal-vniispk.ru/1063-7826/article/view/207523
- DOI: https://doi.org/10.1134/S1063782619140148
- ID: 207523
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Resumo
Transparency and sheet resistance measurements of transferred CNT film on glass substrate were performed. Effect of optical lithography and plasma treatment processes on CNT film sheet resistance was analyzed. CNT film demonstrates good electrical conductivity and chemical stability to post-growth processing techniques. The maximum increase in the sheet resistance of the CNT film after optical lithography and plasma treatment processes is no more than 7%.
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Sobre autores
D. Mitin
Saint Petersburg Academic University; Ioffe Institute
Autor responsável pela correspondência
Email: mitindm@mail.ru
Rússia, St. Petersburg, 194021; St. Petersburg, 194021
S. Raudik
Saint Petersburg Academic University
Autor responsável pela correspondência
Email: s.raudik@gmail.com
Rússia, St. Petersburg, 194021
A. Mozharov
ITMO University
Autor responsável pela correspondência
Email: mozharov@spbau.ru
Rússia, St. Petersburg, 197101
A. Bolshakov
Saint Petersburg Academic University
Autor responsável pela correspondência
Email: acr1235@mail.ru
Rússia, St. Petersburg, 194021
V. Fedorov
Saint Petersburg Academic University
Autor responsável pela correspondência
Email: vfedorov.fl@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. Nepokh
Saint Petersburg Academic University
Autor responsável pela correspondência
Email: vneplox@gmail.com
Rússia, St. Petersburg, 194021
P. Rajanna
Skolkovo Institute of Science and Technology
Autor responsável pela correspondência
Email: pramod.rajanna@skolkovotech.ru
Rússia, Moscow, 121205
A. Nasibulin
Skolkovo Institute of Science and Technology
Autor responsável pela correspondência
Email: a.nasibulin@skoltech.ru
Rússia, Moscow, 121205
I. Mukhin
Saint Petersburg Academic University; ITMO University
Autor responsável pela correspondência
Email: imukhin@yandex.ru
Rússia, St. Petersburg, 194021; St. Petersburg, 197101
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