Forming the GaN Nanocrystals on the Graphene-Like g-AlN and g-Si3N3 Surface
- Авторлар: Kozhukhov A.S.1, Aleksandrov I.A.1, Rzheutski N.V.2, Lebiadok E.V.2, Razumets E.A.2, Zhuravlev K.S.1,3, Milakhin D.S.1, Malin T.V.1, Mansurov V.G.1, Galitsyn Y.G.1
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Мекемелер:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
- State Scientific and Production Association “Optics, Optoelectronics, and Laser Technology”
- Novosibirsk State University
- Шығарылым: Том 61, № 12 (2019)
- Беттер: 2329-2334
- Бөлім: Semiconductors
- URL: https://journal-vniispk.ru/1063-7834/article/view/206844
- DOI: https://doi.org/10.1134/S1063783419120308
- ID: 206844
Дәйексөз келтіру
Аннотация
The formation of GaN nanocrystals on the graphene-like AlN (g-AlN) modification and graphene-like (g-Si3N3) silicon nitride by ammonia molecular beam epitaxy has been investigated. It has been found that the GaN growth on the g-Si3N3 surface leads to the formation of misoriented nanocrystals. During the GaN growth on the g-AlN surface, the epitaxial growth of similarly oriented GaN quantum dots of the graphite-like modification has been observed. The lattice parameters and energy structure of two graphite-like GaN modifications with the alternating AB (graphite structure) and AA+ (hexagonal boron nitride structure) layers have been calculated.
Негізгі сөздер
Авторлар туралы
A. Kozhukhov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
I. Aleksandrov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
N. Rzheutski
State Scientific and Production Association “Optics, Optoelectronics, and Laser Technology”
Email: dmilakhin@isp.nsc.ru
Белоруссия, Minsk, 220072
E. Lebiadok
State Scientific and Production Association “Optics, Optoelectronics, and Laser Technology”
Email: dmilakhin@isp.nsc.ru
Белоруссия, Minsk, 220072
E. Razumets
State Scientific and Production Association “Optics, Optoelectronics, and Laser Technology”
Email: dmilakhin@isp.nsc.ru
Белоруссия, Minsk, 220072
K. Zhuravlev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090; Novosibirsk, 630090
D. Milakhin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
T. Malin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
V. Mansurov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
Yu. Galitsyn
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: dmilakhin@isp.nsc.ru
Ресей, Novosibirsk, 630090
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