Email this article Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems
- Authors: Amelichev V.V.1, Polomoshnov S.A.1,2, Nikolaeva N.N.1, Tikhonov R.D.1, Kupriyanova M.A.1
-
Affiliations:
- SMS “Technological Center”
- National Research University “MIET”
- Issue: Vol 51, No 13 (2017)
- Pages: 1707-1708
- Section: Microelectronic and Nanoelectronic Technology
- URL: https://journal-vniispk.ru/1063-7826/article/view/202131
- DOI: https://doi.org/10.1134/S1063782617130024
- ID: 202131
Cite item
Open Access
Access granted
Subscription Access
Abstract
The results of investigating local electrochemical deposition from a chloride electrolyte are presented. Ni81Fe19 permalloy films with magnetic properties similar to those of 3D samples with a uniform thickness and low mechanical stresses without high-temperature annealing are obtained. The dependences of the rate of congruent deposition of the permalloy on the current density are presented.
About the authors
V. V. Amelichev
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Russian Federation, Zelenograd, Moscow, 124498
S. A. Polomoshnov
SMS “Technological Center”; National Research University “MIET”
Email: R.Tikhonov@tcen.ru
Russian Federation, Zelenograd, Moscow, 124498; Zelenograd, Moscow, 125993
N. N. Nikolaeva
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Russian Federation, Zelenograd, Moscow, 124498
R. D. Tikhonov
SMS “Technological Center”
Author for correspondence.
Email: R.Tikhonov@tcen.ru
Russian Federation, Zelenograd, Moscow, 124498
M. A. Kupriyanova
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Russian Federation, Zelenograd, Moscow, 124498
Supplementary files
