Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems
- Autores: Amelichev V.V.1, Polomoshnov S.A.1,2, Nikolaeva N.N.1, Tikhonov R.D.1, Kupriyanova M.A.1
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Afiliações:
- SMS “Technological Center”
- National Research University “MIET”
- Edição: Volume 51, Nº 13 (2017)
- Páginas: 1707-1708
- Seção: Microelectronic and Nanoelectronic Technology
- URL: https://journal-vniispk.ru/1063-7826/article/view/202131
- DOI: https://doi.org/10.1134/S1063782617130024
- ID: 202131
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Resumo
The results of investigating local electrochemical deposition from a chloride electrolyte are presented. Ni81Fe19 permalloy films with magnetic properties similar to those of 3D samples with a uniform thickness and low mechanical stresses without high-temperature annealing are obtained. The dependences of the rate of congruent deposition of the permalloy on the current density are presented.
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Sobre autores
V. Amelichev
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498
S. Polomoshnov
SMS “Technological Center”; National Research University “MIET”
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498; Zelenograd, Moscow, 125993
N. Nikolaeva
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498
R. Tikhonov
SMS “Technological Center”
Autor responsável pela correspondência
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498
M. Kupriyanova
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498
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