Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems
- Авторлар: Amelichev V.V.1, Polomoshnov S.A.1,2, Nikolaeva N.N.1, Tikhonov R.D.1, Kupriyanova M.A.1
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Мекемелер:
- SMS “Technological Center”
- National Research University “MIET”
- Шығарылым: Том 51, № 13 (2017)
- Беттер: 1707-1708
- Бөлім: Microelectronic and Nanoelectronic Technology
- URL: https://journal-vniispk.ru/1063-7826/article/view/202131
- DOI: https://doi.org/10.1134/S1063782617130024
- ID: 202131
Дәйексөз келтіру
Аннотация
The results of investigating local electrochemical deposition from a chloride electrolyte are presented. Ni81Fe19 permalloy films with magnetic properties similar to those of 3D samples with a uniform thickness and low mechanical stresses without high-temperature annealing are obtained. The dependences of the rate of congruent deposition of the permalloy on the current density are presented.
Негізгі сөздер
Авторлар туралы
V. Amelichev
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Ресей, Zelenograd, Moscow, 124498
S. Polomoshnov
SMS “Technological Center”; National Research University “MIET”
Email: R.Tikhonov@tcen.ru
Ресей, Zelenograd, Moscow, 124498; Zelenograd, Moscow, 125993
N. Nikolaeva
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Ресей, Zelenograd, Moscow, 124498
R. Tikhonov
SMS “Technological Center”
Хат алмасуға жауапты Автор.
Email: R.Tikhonov@tcen.ru
Ресей, Zelenograd, Moscow, 124498
M. Kupriyanova
SMS “Technological Center”
Email: R.Tikhonov@tcen.ru
Ресей, Zelenograd, Moscow, 124498
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