Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems


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Resumo

The results of investigating local electrochemical deposition from a chloride electrolyte are presented. Ni81Fe19 permalloy films with magnetic properties similar to those of 3D samples with a uniform thickness and low mechanical stresses without high-temperature annealing are obtained. The dependences of the rate of congruent deposition of the permalloy on the current density are presented.

Sobre autores

V. Amelichev

SMS “Technological Center”

Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498

S. Polomoshnov

SMS “Technological Center”; National Research University “MIET”

Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498; Zelenograd, Moscow, 125993

N. Nikolaeva

SMS “Technological Center”

Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498

R. Tikhonov

SMS “Technological Center”

Autor responsável pela correspondência
Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498

M. Kupriyanova

SMS “Technological Center”

Email: R.Tikhonov@tcen.ru
Rússia, Zelenograd, Moscow, 124498

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